Shenai, Deo: search on Z-Library

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1

Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Reduction to Nickel Films

Li, Zhefeng, Gordon, Roy G., Pallem, Venkateswara, Li, Huazhi, Shenai, Deo V.

Journal:

Chemistry of Materials

Year:

2010

Language:

english

File:

PDF, 2.43 MB

english, 2010

2

Novel Zirconium Formamidinate Precursor for the ALD of ZrO2

Li, Huazhi, Shenai, Deo V, Lehn, Jean-Sebastien

Journal:

MRS Proceedings

Year:

2009

Language:

english

File:

PDF, 75 KB

english, 2009

3

Safer alternative liquid germanium precursors for relaxed graded SiGe layers and strained silicon by MOVPE

Deo V. Shenai, Ronald L. DiCarlo Jr, Michael B. Power, Artashes Amamchyan, Randall J. Goyette, Egbert Woelk

Journal:

Journal of Crystal Growth

Year:

2007

Language:

english

File:

PDF, 451 KB

english, 2007

4

Vapor Deposition of Highly Conformal Copper Seed Layers for Plating Through-Silicon Vias (TSVs)

Au, Yeung, Min Wang, Qing, Li, Huazhi, Lehn, Jean-Sebastien M., Shenai, Deo V., Gordon, Roy G.

Journal:

Journal of The Electrochemical Society

Year:

2012

Language:

english

File:

PDF, 185 KB

english, 2012

5

[ECS 210th ECS Meeting - Cancun, Mexico (October 29-November 3, 2006)] ECS Transactions - Development of Novel Germanium Compounds for Use in SiGe Epitaxy

Shenai, Deo, DiCarlo, Ron, Power, Mike, Amamchyan, Art, Goyette, Randy, Woelk, Egbert, Sagnes, Isabel

Year:

2006

Language:

english

File:

PDF, 361 KB

english, 2006

6

[ECS 210th ECS Meeting - Cancun, Mexico (October 29-November 3, 2006)] ECS Transactions - The Deposition of Polycrystalline SiGe with Different Ge Precursors

Shi, Xiaoping, Schaekers, Marc, Leys, Frederik, Loo, Roger, Caymax, Matty R., Brus, Stephan, Zhao, Chao, Lamare, Bruno, Woelk, Egbert, Shenai, Deo

Year:

2006

Language:

english

File:

PDF, 963 KB

english, 2006

7

Correlation of vapor pressure equation and film properties with trimethylindium purity for the MOVPE grown III–V compounds

Deo V. Shenai, Michael L. Timmons, Ronald L. DiCarlo, Gregory K. Lemnah, Robert S. Stennick

Journal:

Journal of Crystal Growth

Year:

2003

Language:

english

File:

PDF, 136 KB

english, 2003

8

[ECS 210th ECS Meeting - Cancun, Mexico (October 29-November 3, 2006)] ECS Transactions - Comparison of ALD of HfO2, SiO2, and HfSiOx Thin Films Using Various Metal/Silicon Alkylamide Precursors and O3

Bartholomew, Lawrence, Barelli, Carl, Owyang, Jon, DiCarlo, Ron, Shenai, Deo, Marsman, Charles, Senzaki, Yoshi

Year:

2007

Language:

english

File:

PDF, 359 KB

english, 2007

9

Novel Hf and La Formamidinates for ALD Application

Li, Huazhi, Shenai, Deo V

Journal:

MRS Proceedings

Year:

2009

Language:

english

File:

PDF, 260 KB

english, 2009

10

Atomic Layer Deposition of Lanthanum-Based Ternary Oxides

Wang, Hongtao, Wang, Jun-Jieh, Gordon, Roy, Lehn, Jean-Sébastien M., Li, Huazhi, Hong, Daewon, Shenai, Deo V.

Journal:

Electrochemical and Solid-State Letters

Year:

2009

Language:

english

File:

PDF, 475 KB

english, 2009

11

GC/MS analyses of MOVPE precursors and characterization of impurities in trimethylindium, trimethylaluminum and bis(cyclopentadienyl)magnesium

William B. Grant, Artashes Amamchyan, Robert S. Stennick, Deo V. Shenai

Journal:

Journal of Crystal Growth

Year:

2003

Language:

english

File:

PDF, 137 KB

english, 2003

12

Reduction of Residual C and N-Related Impurities by Al2O3 Insertion in Atomic-Layer-Deposited La2O3 Thin Films

Joo Park, Tae, Sivasubramani, Prasanna, Coss, Brian E., Lee, Bongki, Wallace, Robert M., Kim, Jiyoung, Rousseau, Mike, Liu, Xinye, Li, Huazhi, Lehn, Jean-Sebastien, Hong, Daewon, Shenai, Deo

Journal:

Electrochemical and Solid-State Letters

Year:

2011

Language:

english

File:

PDF, 1.58 MB

english, 2011

13

Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films

Li, Zhefeng, Gordon, Roy G., Li, Huazhi, Shenai, Deo V., Lavoie, Christian

Journal:

Journal of The Electrochemical Society

Year:

2010

Language:

english

File:

PDF, 722 KB

english, 2010

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